Hot-target HiPIMS deposition of W-fuzz layers

Abstract

Porous tungsten coatings were prepared by magnetron deposition in He environment. The depositions were carried out in HiPIMS mode with a frequency of 1 kHz and a pulse duration of 300 μs. The tungsten target was thermally insulated from the water-cooled cathode. The samples were mounted on three different distances from the target. Temperature of each sample was measured with a dedicated thermocouple and recorded throughout the deposition process. The structure of resulting W-fuzz layers is analyzed and discussed. The deposition rate of tungsten fuzz in a hot-target magnetron system operated in HiPIMS mode is shown to be ~100 nm/min.