Implementation of Logic Gates using Charge Plasma Based Tunnel FET

Nikita Mahoviya, Prabhat Singh, Dharmendra Singh Yadav
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Abstract

For digital applications, researchers are looking into tunnel field-effect transistors (TFETs) as a possible substitute for MOSFETs. TFETs offer several unique qualities that can be used in digital applications. Utilizing two-dimensional device simulations, a single DGTFET is presented in this paper to implement various logic functions. It is demonstrated that by biasing the two gates individually, DGTFET can be used to implement logic operations like OR and AND. Using the overlap of gate-source region (Lov) and opting the optimum silicon wafer thickness are crucial to getting distinct logic functions from a DGTFET. These applications show that it is possible to compactly create logic functions by taking advantage of the special TFET characteristics namely, ambipolar nature and tunneling’s dependence on gate controlling capability over channel region.
利用电荷等离子体隧道场效应管实现逻辑门
对于数字应用,研究人员正在研究隧道场效应晶体管(tfet)作为mosfet的可能替代品。tfet提供了几个独特的品质,可用于数字应用。利用二维器件模拟,本文提出了一个DGTFET来实现各种逻辑功能。结果表明,通过分别偏置两个栅极,DGTFET可用于实现OR和and等逻辑运算。利用栅极源区(Lov)的重叠和选择最佳硅片厚度对于从DGTFET中获得不同的逻辑功能至关重要。这些应用表明,利用TFET的特殊特性,即双极性特性和隧道效应对通道区域栅极控制能力的依赖,可以紧凑地创建逻辑函数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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