Large Second-Order Nonlinearity in Bulk and Thin-Film SiO2

R. A. Myers, N. Mukherjee, S. Brueck
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引用次数: 2

Abstract

We have previously reported1 the observation of a large second-order nonlinearity in the near surface region of commercially available fused SiO2 windows induced by a combined temperature (200-325°C) and electric field (~ 30 kV/cm) preparation process. This preparation process includes heating the sample, in laboratory atmosphere, while applying a DC bias of 3-5 kV across the ~1.6 mm-thick samples with electrodes that are simply physically contacted to the sample. After several minutes at temperature, the sample is allowed to cool to room temperature with the bias field maintained. Following cooling, the bias field and the electrodes are removed and a permanent second-order nonlinearity is observed. This nonlinearity is monitored by second-harmonic generation, in transmission, using a Q-switched YAG laser source at 1.06 pm focused to an intensity of ~ 10MW/cm2.
大块和薄膜SiO2的大二阶非线性
我们之前报道了在温度(200-325°C)和电场(~ 30 kV/cm)联合制备过程中,在市售熔融SiO2窗口近表面区域观察到一个大的二阶非线性。该制备过程包括在实验室气氛中加热样品,同时在~1.6 mm厚的样品上施加3-5 kV的直流偏压,电极与样品简单地物理接触。在温度下几分钟后,让样品冷却到室温,并保持偏置场。冷却后,偏压场和电极被去除,观察到一个永久的二阶非线性。在传输中,使用调q YAG激光源在1.06 pm聚焦到~ 10MW/cm2的强度,通过二次谐波产生来监测这种非线性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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