A compact SOI model for fully-depleted and partially-depleted 0.25 /spl mu/m SIMOX devices

Ping Chen, Zhihong Liu, C. Yeh, Gang Zhang, K. Nishimura, M. Shimaya, T. Komatsu
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引用次数: 1

Abstract

A compact SOI MOSFET model based on the Bsim3v3 bulk model with new features of effective substrate bias and transition voltage concepts to cover the transition behavior from partially-depleted to fully-depleted modes, R/sub out/ smoothing, enhanced models for impact ionization, L/sub eff/-dependent parasitic BJT and self-heating is proposed. Results obtained from this model are in excellent agreement with the experimental I-V, C-V and propagation-delay time data.
一种紧凑的SOI模型,适用于完全耗尽和部分耗尽的0.25 /spl mu/m SIMOX器件
基于Bsim3v3体模型,提出了一个紧凑的SOI MOSFET模型,该模型具有有效衬底偏压和过渡电压概念的新特征,涵盖了从部分耗尽到完全耗尽模式的转变行为,R/sub - out/平滑,增强的冲击电离模型,L/sub - eff/依赖的寄生BJT和自加热。该模型得到的结果与实验I-V、C-V和传播延迟时间数据非常吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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