Vertical leakage/breakdown mechanisms in AlGaN/GaN-on-Si structures

Chunhua Zhou, Q. Jiang, Sen Huang, K. J. Chen
{"title":"Vertical leakage/breakdown mechanisms in AlGaN/GaN-on-Si structures","authors":"Chunhua Zhou, Q. Jiang, Sen Huang, K. J. Chen","doi":"10.1109/ISPSD.2012.6229069","DOIUrl":null,"url":null,"abstract":"In this paper, we studied the vertical leakage/breakdown mechanisms in AlGaN/GaN structures grown on low resistivity p-type (111) Si substrate by temperature-dependent current-voltage measurements. We suggested that the top-to-substrate vertical leakage/breakdown is dominated by the space-charge-limited current (SCLC) conduction mechanism involving both acceptor and donor traps in buffer/transition layer. Based on temperature-dependent transient backgating measurements, the acceptor level and donor level were determined to be at EV+543 meV and EC-616 meV, respectively.","PeriodicalId":371298,"journal":{"name":"2012 24th International Symposium on Power Semiconductor Devices and ICs","volume":"6 4","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-06-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"25","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 24th International Symposium on Power Semiconductor Devices and ICs","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2012.6229069","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 25

Abstract

In this paper, we studied the vertical leakage/breakdown mechanisms in AlGaN/GaN structures grown on low resistivity p-type (111) Si substrate by temperature-dependent current-voltage measurements. We suggested that the top-to-substrate vertical leakage/breakdown is dominated by the space-charge-limited current (SCLC) conduction mechanism involving both acceptor and donor traps in buffer/transition layer. Based on temperature-dependent transient backgating measurements, the acceptor level and donor level were determined to be at EV+543 meV and EC-616 meV, respectively.
AlGaN/GaN-on-Si结构的垂直泄漏/击穿机制
在本文中,我们通过温度相关的电流电压测量研究了在低电阻率p型(111)Si衬底上生长的AlGaN/GaN结构的垂直泄漏/击穿机制。我们认为,从顶部到衬底的垂直泄漏/击穿是由空间电荷限制电流(SCLC)传导机制主导的,该机制涉及缓冲/过渡层中的受体和供体陷阱。基于温度相关的瞬态背门测量,确定了受体能级和供体能级分别为EV+543 meV和EC-616 meV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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