Analysis of an effect of perturbations in SWHM and illuminating optical scheme parameters on an aerial image

Abstract

There is considered a new method of sub-wavelength holographic lithography (SWHL) for creation of IC layers aerial images. This approach proposes to use very local defects tolerable holographic patterns and simple optical scheme for photoresist exposure. The paper investigates influence of different perturbations occurring during either mask manufacturing or photoresist exposing on resulting topology image. Simulation showed that practically all perturbations which appear when using modern equipment do not significantly distort the resulting image, while the most problematic phase noise effects could be removed by introducing them into sub-wavelength holographic mask (SWHM) calculation.