Bismuth doped ZnO films as anti-reflection coatings for solar cells

T. Fangsuwannarak, P. Krongarrom, J. Kaewphoka, S. Rattanachan
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引用次数: 4

Abstract

For fabrication of zinc oxide-based optoelectronic devices, especially solar cells, the development of cost-effective and low-temperature synthesis techniques for the deposition of high quality ZnO films is paramount. In this paper, incorporating Bi-doped ZnO films was prepared by the sol-gel spin coating method. The optical constants of the prepared thin films depend on the synthesis conditions. XRD measurement show that a high quality of ZnO:Bi nanostructure have preferably grow along (002) direction. The ZnO:Bi thin films were fabricated as antireflection coatings (ARCs) for solar cells. The nanoscale morphology altered through the different Bi content in the films, has a great effect on the macroscopic ARC performance. The optical constants as refractive index and extinction coefficient are determined through the transmittance and reflectance spectra. Textured ZnO:Bi films with average thickness ranging from 87 nm to 94 nm present a broadband reflection suppression from 400 to 1100 nm wavelength. The refractive index around 1.31-1.47 estimated is appropriate to an ARC layer for Si solar cells.
铋掺杂ZnO薄膜作为太阳能电池的增透涂层
对于以氧化锌为基础的光电器件,特别是太阳能电池的制造,开发低成本和低温的合成技术来沉积高质量的氧化锌薄膜是至关重要的。本文采用溶胶-凝胶自旋镀膜的方法制备了掺杂双掺杂ZnO薄膜。所制备薄膜的光学常数取决于合成条件。XRD测试表明,高质量的ZnO:Bi纳米结构沿(002)方向生长较好。制备了ZnO:Bi薄膜作为太阳能电池的增透涂层。不同铋含量的薄膜在纳米尺度上的形貌变化对电弧的宏观性能有很大影响。通过透射光谱和反射光谱确定折射率和消光系数等光学常数。平均厚度为87 ~ 94 nm的ZnO:Bi织合膜在400 ~ 1100 nm波段具有宽带反射抑制作用。估计的折射率在1.31-1.47左右是适合于硅太阳能电池电弧层的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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