Fabrication of UV detector by Schottky Pd/ZnO/Si Contacts

Samsam Amirpoor, A. Salehi, Hamed Moienikhah
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引用次数: 1

Abstract

High performance UV Schottky photodiodes fabricated by ZnO thin film on Si substrate using sol-gel method have been studied. The Photodiode prepared in this study has a structure of Metal/ZnO/n-Si. The current–voltage (I–V) characteristics of the as-fabricated Schottky photodiodes show an excellent room temperature contrast ratio of ~7325.38 and responsivity of ~71.68 A/W at a reverse bias voltage of -4V, when the device was illuminated by an UV source of ~600 µW output power at ~360 nm. Measurements of contrast ratio and responsivity were made at room temperature, the obtained values are believed to be superior compared to those reported in literature.
肖特基Pd/ZnO/Si触点制备紫外探测器
采用溶胶-凝胶法制备了硅衬底上ZnO薄膜的高性能紫外肖特基光电二极管。本研究制备的光电二极管具有金属/ZnO/n-Si结构。当输出功率为~600 μ W的紫外光源在~360 nm下照射时,所制备的肖特基光电二极管在-4V的反向偏置电压下具有优异的室温对比度(~7325.38)和响应度(~71.68 A/W)。在室温下进行了对比度和响应度的测量,与文献报道的值相比,得到的值被认为是优越的。
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