High-Translucency Zirconia Following Chemical Vapor Deposition with SiH4: Evidence of Surface Modifications and Improved Bonding.

IF 4.6 Q2 MATERIALS SCIENCE, BIOMATERIALS
Jaiane Bandoli Monteiro, Pedro Henrique Condé Oliveira Prado, Gabriela Ribeiro Zucco, Tiago Moreira Bastos Campos, João Paulo Barros Machado, Vladimir Jesus Trava-Airoldi, Renata Marques de Melo
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Abstract

Purpose: To evaluate the effect of plasma-enhanced chemical vapor deposition (PECVD) with silicon hydride (SiH4) at different times on HT-zirconia surface characteristics and bonding of composite cement before and after thermocycling.

Materials and methods: Blocks of HT zirconia were obtained, polished, sintered and divided into five groups, according to PECVD time (n = 31): Zr-30 (30 s), Zr-60 (60 s), Zr-120 (120 s) and Zr-300 (300 s). The control group (Zr-0) did not receive PECVD. X-ray diffraction (XRD), Fourier-transform infrared spectroscopy (FTIR), energy dispersive spectroscopy (EDS) in conjunction with field-emission scanning electron microscopy (FE-SEM), x-ray photoelectron spectroscopy (XPS), goniometry, and profilometry tests were used for chemical and topographic characterization. Monobond N silane (Ivoclar Vivadent) was applied to the surface, and a cylinder of composite cement (Variolink N) was made (3 x 3 mm). Half of the specimens of each group were stored for 24 h or subjected to thermocycling (6 x 103 cycles). A shear bond strength (SBS) test was performed. Results were subjected to one-way ANOVA and Tukey's tests (α = 0.05).

Results: For experimental groups, XPS showed that formation of Si-O bonds contributed to increased surface free energy (SFE). FE-SEM and EDS showed that the longer the deposition time, the greater the amount of silicon on the surface. Zr-60 and Zr-300 presented higher and lower surface roughnesses, respectively. The silicon penetrated the microstructure, causing higher stress concentrations. The bond strength to composite cement was improved after all PECVD deposition times.

Conclusion: The PECVD technique with SiH4, associated with chemical treatment with primer based on silane methacrylate, is a solely chemical surface treatment capable of maintaining bonding between composite cement and HT zirconia.

使用 SiH4 进行化学气相沉积后的高透明度氧化锆:表面改性和粘接改善的证据。
目的:评估不同时间的氢化硅(SiH4)等离子体增强化学气相沉积(PECVD)对热循环前后高温氧化锆表面特性和复合骨水泥粘结性的影响:获得高温氧化锆块,抛光、烧结,并根据 PECVD 时间分为五组(n = 31):Zr-30(30 秒)、Zr-60(60 秒)、Zr-120(120 秒)和 Zr-300(300 秒)。对照组(Zr-0)未进行 PECVD。X 射线衍射 (XRD)、傅立叶变换红外光谱 (FTIR)、能量色散光谱 (EDS) 以及场发射扫描电子显微镜 (FE-SEM)、X 射线光电子能谱 (XPS)、测角仪和轮廓仪测试被用于化学和形貌表征。在试样表面涂抹 Monobond N 硅烷(Ivoclar Vivadent),并制作一个圆柱体的复合骨水泥(Variolink N)(3 x 3 毫米)。每组一半的试样存放 24 小时或进行热循环(6 x 103 个循环)。进行剪切粘接强度(SBS)测试。结果经单向方差分析和 Tukey's 检验(α = 0.05):实验组的 XPS 显示,Si-O 键的形成导致了表面自由能(SFE)的增加。FE-SEM 和 EDS 显示,沉积时间越长,表面的硅量越多。Zr-60 和 Zr-300 的表面粗糙度分别较高和较低。硅渗透到了微观结构中,导致了更高的应力集中。在所有的 PECVD 沉积时间之后,与复合水泥的粘接强度都有所提高:结论:使用 SiH4 的 PECVD 技术与甲基丙烯酸硅烷底漆的化学处理相结合,是一种能够保持复合水泥与 HT 氧化锆之间粘接性的唯一化学表面处理方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
ACS Applied Bio Materials
ACS Applied Bio Materials Chemistry-Chemistry (all)
CiteScore
9.40
自引率
2.10%
发文量
464
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