M. Ganchev, A. Katerski, S. Stankova, J. S. Eensalu, P. Terziyska, R. Gergova, H. Dikov, G. Popkirov, P. Vitanov
{"title":"Tin dioxide thin films deposited by sol – gel technique","authors":"M. Ganchev, A. Katerski, S. Stankova, J. S. Eensalu, P. Terziyska, R. Gergova, H. Dikov, G. Popkirov, P. Vitanov","doi":"10.1063/1.5091316","DOIUrl":null,"url":null,"abstract":"Wide band gap metal oxide semiconductors are an important material base in optoelectronic industry. Dye sensitized solar cells and especially the organometallic perovskite ones present a new way of application of these materials with specific requirements for their properties. Therefore the reduction of production costs in relation to the efficiency is an important factor for its commercialization. In this work we present sol-gel approach to form dense, uniform and voids free electron selective layers of intrinsic SnO2 for application in nano-sized organometallic photovoltaics. The purpose is to find conditions for deposition at lowest temperatures of compact and well crystallized SnO2 thin films with effective electron blocking ability with perspective to apply on polymer substrates. The process of pyrolysis of the precursors into expected SnO2 was investigated by Differential Scanning Calorimetry. The results were used to have an insight for main reaction steps and to define an adequate annealing regime. The films were characterized by X – ray – photoelectron spectroscopy XPS, diffractometry, UV – Vis spectrophotometry and Scanning Electron Microscopy. Different solvents for the precursor SnCl4.5H2O were investigated in order to minimize their influence onto polymeric substrates. In the row between ethanol, methanol and isopropanol the last ones yielded compact layers without pinholes and cracks. The level of electrical leakage was estimated by cyclic voltammetry measurements of residual current in aqueous redox solution. The quality of the coverage depends on the concentration of the precursor solution but at over 0.5 M SnCl4 the root mean squares (RMS) roughness of the films increases.Wide band gap metal oxide semiconductors are an important material base in optoelectronic industry. Dye sensitized solar cells and especially the organometallic perovskite ones present a new way of application of these materials with specific requirements for their properties. Therefore the reduction of production costs in relation to the efficiency is an important factor for its commercialization. In this work we present sol-gel approach to form dense, uniform and voids free electron selective layers of intrinsic SnO2 for application in nano-sized organometallic photovoltaics. The purpose is to find conditions for deposition at lowest temperatures of compact and well crystallized SnO2 thin films with effective electron blocking ability with perspective to apply on polymer substrates. The process of pyrolysis of the precursors into expected SnO2 was investigated by Differential Scanning Calorimetry. The results were used to have an insight for main reaction steps and to define an adequate annealing regime...","PeriodicalId":0,"journal":{"name":"","volume":" ","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-02-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/1.5091316","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Wide band gap metal oxide semiconductors are an important material base in optoelectronic industry. Dye sensitized solar cells and especially the organometallic perovskite ones present a new way of application of these materials with specific requirements for their properties. Therefore the reduction of production costs in relation to the efficiency is an important factor for its commercialization. In this work we present sol-gel approach to form dense, uniform and voids free electron selective layers of intrinsic SnO2 for application in nano-sized organometallic photovoltaics. The purpose is to find conditions for deposition at lowest temperatures of compact and well crystallized SnO2 thin films with effective electron blocking ability with perspective to apply on polymer substrates. The process of pyrolysis of the precursors into expected SnO2 was investigated by Differential Scanning Calorimetry. The results were used to have an insight for main reaction steps and to define an adequate annealing regime. The films were characterized by X – ray – photoelectron spectroscopy XPS, diffractometry, UV – Vis spectrophotometry and Scanning Electron Microscopy. Different solvents for the precursor SnCl4.5H2O were investigated in order to minimize their influence onto polymeric substrates. In the row between ethanol, methanol and isopropanol the last ones yielded compact layers without pinholes and cracks. The level of electrical leakage was estimated by cyclic voltammetry measurements of residual current in aqueous redox solution. The quality of the coverage depends on the concentration of the precursor solution but at over 0.5 M SnCl4 the root mean squares (RMS) roughness of the films increases.Wide band gap metal oxide semiconductors are an important material base in optoelectronic industry. Dye sensitized solar cells and especially the organometallic perovskite ones present a new way of application of these materials with specific requirements for their properties. Therefore the reduction of production costs in relation to the efficiency is an important factor for its commercialization. In this work we present sol-gel approach to form dense, uniform and voids free electron selective layers of intrinsic SnO2 for application in nano-sized organometallic photovoltaics. The purpose is to find conditions for deposition at lowest temperatures of compact and well crystallized SnO2 thin films with effective electron blocking ability with perspective to apply on polymer substrates. The process of pyrolysis of the precursors into expected SnO2 was investigated by Differential Scanning Calorimetry. The results were used to have an insight for main reaction steps and to define an adequate annealing regime...
宽禁带金属氧化物半导体是光电工业的重要材料基础。染料敏化太阳能电池,特别是有机金属钙钛矿太阳能电池,对这些材料的性能有特殊的要求,为它们的应用提供了新的途径。因此,降低与效率相关的生产成本是其商业化的重要因素。在这项工作中,我们提出了溶胶-凝胶方法来形成致密、均匀和空隙的自由电子选择层的本征氧化锡,用于纳米有机金属光伏电池。目的是寻找在最低温度下沉积致密且结晶良好的SnO2薄膜的条件,该薄膜具有有效的电子阻挡能力,有望应用于聚合物衬底。采用差示扫描量热法研究了前驱体热解生成SnO2的过程。结果用于了解主要反应步骤并确定适当的退火制度。采用X射线光电子能谱、衍射、紫外可见分光光度和扫描电镜对膜进行了表征。研究了前驱体SnCl4.5H2O的不同溶剂对聚合物底物的影响。在乙醇、甲醇和异丙醇之间的一排中,最后一排产生了致密的层,没有针孔和裂缝。通过循环伏安法测量水氧化还原溶液中的剩余电流来估计电泄漏的水平。覆盖的质量取决于前驱体溶液的浓度,但在超过0.5 M SnCl4时,薄膜的均方根(RMS)粗糙度增加。宽禁带金属氧化物半导体是光电工业的重要材料基础。染料敏化太阳能电池,特别是有机金属钙钛矿太阳能电池,对这些材料的性能有特殊的要求,为它们的应用提供了新的途径。因此,降低与效率相关的生产成本是其商业化的重要因素。在这项工作中,我们提出了溶胶-凝胶方法来形成致密、均匀和空隙的自由电子选择层的本征氧化锡,用于纳米有机金属光伏电池。目的是寻找在最低温度下沉积致密且结晶良好的SnO2薄膜的条件,该薄膜具有有效的电子阻挡能力,有望应用于聚合物衬底。采用差示扫描量热法研究了前驱体热解生成SnO2的过程。结果用于了解主要反应步骤并定义适当的退火制度。