2013 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)

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2013 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - 最新文献

Laser anneal assisted contact resistivity reduction with post-silicide implantation for 14nm node and beyond

Pub Date : 2013-04-22 DOI: 10.1109/VLSI-TSA.2013.6545635 C. Ni, K. V. Rao, F. Khaja, S. Sharma, B. Zheng, J. Ramalingam, J. Gelatos, J. Lei, S. Muthukrishnan, R. Hung, C. Chang, N. Variam, A. Brand

Microscopic model for the kinetics of the reset process in HfO2 RRAM

Pub Date : 2013-04-22 DOI: 10.1109/VLSI-TSA.2013.6545582 A. Kalantarian, G. Bersuker, B. Butcher, D. Gilmer, S. Privitera, S. Lombardo, R. Geer, Y. Nishi, P. Kirsch, R. Jammy

Rough surface improved formation-free low power resistive switching memory using IrOx/GdOx/W structure

Pub Date : 2013-04-22 DOI: 10.1109/VLSI-TSA.2013.6545585 D. Jana, S. Maikap, A. Prakash, H. Y. Lee, W. Chen, F. Chen, M. Kao, M. Tsai

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