Metrology, Inspection, and Process Control for Microlithography XXXII

In-line characterization of non-selective SiGe nodule defects with scatterometry enabled by machine learning

Pub Date : 2018-09-05 DOI: 10.1117/12.2297377 Kong Dexin, R. Chao, M. Breton, Chi-Chun Liu, G. R. Muthinti, S. Seo, N. Loubet, P. Montanini, J. Gaudiello, V. Basker, A. Cepler, Susan Ng-Emans, M. Sendelbach, Itzik Kaplan, G. Barak, D. Schmidt, Frougier Julien

A holistic metrology sensitivity study for pattern roughness quantification on EUV patterned device structures with mask design induced roughness

Pub Date : 2018-08-02 DOI: 10.1117/12.2297265 S. Levi, Ishai Swrtsband, Vladislav Kaplan, I. Englard, K. Ronse, B. Kutrzeba-Kotowska, G. Dai, F. Scholze, Kenslea Anne, Hayley Johanesen, L. Kwakman, I. Turovets, Maxim Rabinovitch, S. Krannich, N. Kasper, B. Connolly, R. Wende, M. Bender

Mueller matrix spectroscopic ellipsometry based scatterometry simulations of Si and Si/SixGe1-x/Si/SixGe1-x/Si fins for sub-7nm node gate-all-around transistor metrology

Pub Date : 2018-06-06 DOI: 10.1117/12.2296988 S. Dey, A. Diebold, Nick Keller, M. Korde