1993 International Symposium on VLSI Technology, Systems, and Applications Proceedings of Technical Papers

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1993 International Symposium on VLSI Technology, Systems, and Applications Proceedings of Technical Papers - 最新文献

The effect of surface electric and magnetic fields on negative charge-up during high-current ion implantation

Pub Date : 1993-05-12 DOI: 10.1109/VTSA.1993.263672 K. Mameno, A. Nishida, H. Nagasawa, H. Fujiwara, K. Suzuki, Y. Matsushita, K. Yoneda

Yield improvement for a 3.5-ns BiCMOS technology in a 200-mm manufacturing line

Pub Date : 1993-05-12 DOI: 10.1109/VTSA.1993.263667 B. Chen, T. Hook, G. Starkey, A. Bhattacharyya, M. Faucher, C. Racine, C. Willets, S. Eslinger, S. Kulkarni, W. King, C. Washburn, J. Piccirillo, S. Mongeon, A. Johnson, Edward Gabrielle

Wiring for manufacturability and yield maximization in computer-aided VLSI design

Pub Date : 1993-05-12 DOI: 10.1109/VTSA.1993.263629 H.H. Chen, C. K. Wong

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