2008 Joint Non-Volatile Semiconductor Memory Workshop and International Conference on Memory Technology and Design

查看最新文献

1355

2008 Joint Non-Volatile Semiconductor Memory Workshop and International Conference on Memory Technology and Design - 最新文献

Improved Retention for a Al2O3 IPD Embedded Flash Cell without Top-Oxide

Pub Date : 2008-05-18 DOI: 10.1109/NVSMW.2008.33 J. Power, D. Shum, Y. Gong, S. Bogacz, J. Haeupel, H. Estel, R. Strenz, R. Kakoschke, K. van der Zanden, R. Allinger

The Impact of Interference on Multi-Level-Cell Applications in Scaled Nitride-Storage Flash Memory

Pub Date : 2008-05-18 DOI: 10.1109/NVSMW.2008.43 I. Yang, Y.W. Chang, G.W. Wu, T. Lu, K.C. Chen, C. Lu

A Highly Reliable Logic NVM "eCFlash (Embedded CMOS Flash)" Utilizing Differential Sense-Latch Cell with Charge-Trapping Storage

Pub Date : 2008-05-18 DOI: 10.1109/NVSMW.2008.29 T. Ogura, M. Mihara, Y. Kawajiri, K. Kobayashi, S. Shimizu, S. Shukuri, N. Ajika, M. Nakashima

查看全部

免责声明：
本页显示期刊或杂志信息，仅供参考学习，不是任何期刊杂志官网，不涉及出版事务，特此申明。如需出版一切事务需要用户自己向出版商联系核实。若本页展示内容有任何问题，请联系我们，邮箱：info@booksci.cn，我们会认真核实处理。