Proceedings of 2010 International Symposium on VLSI Technology, System and Application

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Proceedings of 2010 International Symposium on VLSI Technology, System and Application - 最新文献

Planar FDSOI technology for sub 22nm nodes

Pub Date : 2010-04-26 DOI: 10.1109/VTSA.2010.5488963 O. Faynot, F. Andrieu, C. Fenouillet-Béranger, O. Weber, P. Perreau, L. Tosti, L. Brevard, O. Rozeau, P. Scheiblin, O. Thomas, T. Poiroux

Investigation of trapping/detrapping mechanisms in Al2O3 electron/hole traps and their influence on TANOS memory operations

Pub Date : 2010-04-26 DOI: 10.1109/VTSA.2010.5488951 L. Larcher, A. Padovani, V. della Marca, P. Pavan, A. Bertacchini

A new self-aligned contact technology for III-V MOSFETs

Pub Date : 2010-04-26 DOI: 10.1109/VTSA.2010.5488907 Huaxin Guo, Xingui Zhang, H. Chin, X. Gong, S. Koh, Chunlei Zhan, G. Luo, Chun-Yen Chang, Hau-Yu Lin, C. Chien, Zong-You Han, Shih-Chiang Huang, Chao-Ching Cheng, C. Ko, C. Wann, Y. Yeo

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