2006 International Workshop on Junction Technology

查看最新文献

664

2006 International Workshop on Junction Technology - 最新文献

Shallow junctions in silicon via low thermal budget processing

Pub Date : 2006-08-14 DOI: 10.1109/IWJT.2006.220850 B. Sealy, A.J. Smith, T. Alzanki, N. Bennett, L. Li, C. Jeynes, B. Colombeau, E. Collart, N. Emerson, R. Gwilliam, N. Cowern

Control of both number and position of dopant atoms in semiconductors by single ion implantation

Pub Date : 2006-08-14 DOI: 10.1109/IWJT.2006.220851 T. Shinada, T. Kurosawa, T. Kobayashi, H. Nakayama, I. Ohdomari

A Study of Nickel Silicide Formed on SOI Substrate with Different Ni/Co Thicknesses for Nano-scale CMOSFET

Pub Date : 2006-08-14 DOI: 10.1109/IWJT.2006.220887 Soon-Yen Jung, Soon-Young Oh, Yong-Jin Kim, Won-Jae Lee, Ying-Ying Zhang, Z. Zhong, H. Lee

查看全部

免责声明：
本页显示期刊或杂志信息，仅供参考学习，不是任何期刊杂志官网，不涉及出版事务，特此申明。如需出版一切事务需要用户自己向出版商联系核实。若本页展示内容有任何问题，请联系我们，邮箱：info@booksci.cn，我们会认真核实处理。