Effects of 10 MeV Al4+ ions irradiation on fluorine-doped tin oxide substrates for photovoltaic device applications

已完结 10 由 244 发布于 2026/4/20 16:52:48

DOI:10.1088/1361-6463/abf959
文献类型：期刊论文
补充材料：只需要正文
文献链接：https://doi.org/10.1088/1361-6463/abf959

IOPscience

Abstract：The effects of 10 MeV Al4+ ions irradiation on structural, surface morphological, optical and electrical properties of fluorine-doped tin oxide (FTO) substrates are presented for solar cell

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