Effects of the substrate temperature on the deposition of thin SiOx films by atmospheric pressure microwave plasma torch (TIA)

已完结 10 由 Tina 发布于 2026/5/25 13:03:36

DOI:10.1016/j.surfcoat.2011.03.123
文献类型：期刊论文
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文献链接：https://doi.org/10.1016/j.surfcoat.2011.03.123

Elsevier

Abstract：The effect of surface temperature on the deposition of silicon oxide (SiOx) films with a non-thermal microwave axial injection torch (TIA) was investigated in an open air reactor. Argon was

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