Towards industrial in-field optical metrology: A wavefront aberrations retrieval technique through single-frame interferogram

已完结 10 由 rik 发布于 2026/10/22 18:01:16

DOI:10.1016/j.measurement.2025.120049
作者：Li Miao, Kun Liu, Zhenyu Wang, Juncheng Yu, Xianlei Liu, Xiaodong Zhang
文献类型：期刊论文
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Elsevier

Abstract：Optical interferometry, renowned for its high precision and non-contact advantages, is widely employed in high-accuracy optical surface measurement and system performance evaluation. However

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