Synthesis of ArF photoresist polymers via continuous-flow RAFT polymerization with an efficient strategy for their thiocarbonylthio end group removal

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DOI:10.1016/j.eurpolymj.2025.114449
作者：Dongsheng Xie , Anjie Yang , Liangwei Li , Haitian Wei , Yameng Shi , Na Li , Xiang Gao
文献类型：期刊论文
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Elsevier

Abstract：Photoresists are critical materials for patterning high-resolution features in semiconductor manufacturing. ArF photoresist polymers, which are predominantly multicomponent acrylate copolyme

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