Investigation on the epitaxial lateral outward growth of single crystal diamond using MPCVD growth technique: Simulation insights under high pressure conditions

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DOI:10.1016/j.carbon.2026.121590
作者：Rakesh Kumar ,?C. Nikhil ,?Akash ,?K. Ramsubramanian ,?V.S.T. Madana ,?N. Arunachalam ,?M.S. Ramachandra Rao
文献类型：期刊论文
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Elsevier

Abstract：Among the various growth techniques of diamond, microwave plasma chemical vapor deposition (MPCVD)-based epitaxial lateral outward growth has emerged as a promising technique for large area

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