Interference-governed electromagnetic-thermal coupling and heat transport in multilayer nanofilms under pulsed extreme-ultraviolet irradiation

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DOI:10.1016/j.applthermaleng.2026.133208
作者：Hongyu He,?Li Ma,?Zhiyi Xie,?Yufan Liu,?Chao Wu,?Qiye Zheng,?Yi Tao,?Yunfei Chen,?Chenhan Liu
文献类型：期刊论文
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Elsevier

Abstract：Mo/Si multilayer mirrors are central to extreme ultraviolet (EUV) lithography, where nanoscale optical interference and heat accumulation together constrain reflectivity and operational stab

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