Fluorinated Components in High-Volume Lithography Materials Are Transformed to Generate PFASs under Oxidizing and Reducing Conditions

已完结 10 由 eueu 发布于 2026/10/30 20:49:50

DOI:10.1021/acs.estlett.5c01246
作者：Richard Marsh,  and , Damian E. Helbling*, 
文献类型：期刊论文
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American Chemical Society (ACS)

Abstract：Fluorinated polymers are essential for lithographic patterning during electronics fabrication, and a variety of per- and polyfluoroalkyl substances (PFASs) of unknown sources are frequently

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