Optical characterization of SiO2 thin films using universal dispersion model over wide spectral range

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DOI:10.1117/12.2227580
作者：D. Franta, D. Ne?as, I. Ohlídal, A. Giglia
文献类型：期刊论文
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Abstract：Vacuum evaporated SiO2 thin films are very important in a design and manufacturing of optical devices produced in optics industry. In this contribution a reliable and precise optical charact

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