Synthesis of Poly(4-hydroxystyrene) for Photoresist: Nitroxide-Mediated Polymerization and Homogeneous Acidic Hydrolysis

已完结 10 由 chxyyd 发布于 2026/9/21 8:15:08

DOI:10.1021/acsomega.6c07017
作者：Jinseok Lee, Dong-Gyun Kim, Sungmin Park, Hyun Kim, Woohwa Lee, Jeewoo Lim, Junsu Kim, Du Yeol Ryu, Taehyoung Kim, Chang-Geun Chae
文献类型：期刊论文
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American Chemical Society (ACS)

Abstract：The growing demand for high-precision chemical materials has intensified the need for stringent control over polymer structures in advanced photolithography. Poly(4-hydroxystyrene) (P(pHS

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