Inherently area-selective atomic layer deposition for the fabrication of 2D and 3D nanostructures

已完结 10 由 ald 发布于 2026/9/20 17:26:54

DOI:10.1016/j.apsusc.2025.165699
作者：Yu Gu ,?Kaipeng Liu ,?Hanhao Wei ,?Shuai Mou ,?Yiyin Zhang ,?Yunfei Luo ,?Weisheng Yue ,?Zeyu Zhao ,?Changtao Wang
文献类型：期刊论文
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Elsevier

Abstract：Bottom-up nanofabrication by area selective atomic layer deposition (AS-ALD) is increasingly being explored as an alternative technology for semiconductor processing. AS-ALD offers many impo

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