Effect of N2-flow on nitrogen vacancies, leakage, and polarization switching in sputtered ferroelectric AlScN films
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由 1 发布于 2026/9/4 15:11:45
作者：Hong-Bo Zhao; Zhan-Yuan Huang; Xin-Bin Ying ORCID logo ; Chi Xie ORCID logo ; Zi-Ying Huang ORCID logo ; Hong-Yan Zhu; Ran Jiang ORCID logo ; David Wei Zhang; Hong-Liang LuCorresponding Author OR
文献类型：期刊论文
补充材料：只需要正文
文献链接：https://pubs.aip.org/aip/apl/article-abstract/128/23/232903/3394634/Effect-of-N2-flow-on-nitrogen-vacancies-leakage?redirectedFrom=fulltext
文献类型：期刊论文
补充材料：只需要正文
文献链接：https://pubs.aip.org/aip/apl/article-abstract/128/23/232903/3394634/Effect-of-N2-flow-on-nitrogen-vacancies-leakage?redirectedFrom=fulltext
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