High-throughput thermodynamic analysis of the CVD of SiC from the SiCl4-CH4-H2 system

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DOI:10.1016/j.surfcoat.2023.129741
作者：Wei Huang ,?Junjun Wang ,?Xu Qingfang ,?Meijun Yang ,?Kai Liu ,?Jian Peng ,?Chuanbin Wang ,?Rong Tu ,?Song Zhang
文献类型：期刊论文
补充材料：只需要正文

Elsevier

Abstract：A high-throughput thermodynamic analysis based on the CALPHAD approach is employed in this study to gain insights into the chemical vapor deposition (CVD) of SiC from the SiCl4-CH4-H2 system

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