Novolak Structures Suitable for High Resolution Positive Photoresists and Application

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DOI:10.2494/photopolymer.2.383
文献类型：期刊论文
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文献链接：https://doi.org/10.2494/PHOTOPOLYMER.2.383

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Abstract：The mechanism of resolution improvement in novolak-based positive photoresists was investigated from the stand-point of the image formation process. The image formation process in the novola

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