The transport and surface reactivity of O atoms during the atmospheric plasma etching of hydrogenated amorphous carbon films

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DOI:10.1088/1361-6595/ab0354
作者：M. Mokhtar Hefny,?D. Ne?as,?L. Zají?ková,?J. Benedikt
文献类型：期刊论文
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IOPscience

Abstract：A remote microscale atmospheric pressure plasma jet with a He/O2 gas mixture is used to etch a hydrogenated amorphous carbon layer. The etched profiles are measured by means of imaging spect

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