Performance of 193-nm resists based on alicyclic methacrylate and cyclo-olefin systems

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DOI:10.1117/12.346883
作者：M. Padmanaban, M. Cook, D. Durham, D. Khanna, A. Klauck-Jacobs, Joseph E. Oberlander, M. D. Rahman, R. Dammel
文献类型：期刊论文
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International Society for Optics and Photonics (SPIE)

Abstract：Among the chemistries/polymers reported for the 193nm photoresist applications, methacrylate copolymers consisting of 2-methyl-2-adamantane methacrylate and mevalonic lactone methacrylate an

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