Overview of photoacid generator design for acetal resist systems

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DOI:10.1117/12.275848
作者：F. Houlihan, O. Nalamasu, E. Reichmanis, A. Timko, U. Varlemann, T. Wallow, N. R. Bantu, J. Biafore, T. Sarubbi, P. A. Falcigno, H. Kirner, N. Muenzel, K. Petschel, H. Schacht, R. Schulz
文献类型：期刊论文
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International Society for Optics and Photonics (SPIE)

Abstract：An overview is given of how the design of photoacid generators (PAGs) is critical to tuning both the lithographic and thermal properties of chemically amplified resist systems. The importanc

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