Study of the Thermal and Intrinsic Stress of Large Area Diamond Film Prepared by HFCVD

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DOI:10.4028/www.scientific.net/KEM.375-376.123
作者：F. Xu,?D. Zuo,?Wengang Lu,?Min Wang,?Hai Zhang
文献类型：期刊论文
补充材料：只需要正文
文献链接：https://doi.org/10.4028/www.scientific.net/KEM.375-376.123

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Abstract：High residual stress that includes thermal and intrinsic stress is an obstacle to the further application of chemical vapor deposited diamond thick film. In this paper, CVD diamond thick fil

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