Impact of aminosilane and silanol precursor structure on atomic layer deposition process

已完结 10 由居鸭发布于 2025/8/31 15:50:40

DOI:10.1016/j.apsusc.2023.156869
作者：Wenling Li , Jiangong Cheng , Zilong Zheng , Qiaohong Liu , Feng Geng , Hui Yan
文献类型：期刊论文
补充材料：只需要正文

Elsevier

Abstract：Atomic layer deposition (ALD) and rapid atomic layer deposition (RALD) have emerged as useful techniques for depositing highly conformal and uniform thin films for advanced semiconductor dev

应助信息

求助已完结，文件已删除 如有需求请重新发布求助一键发布

感谢使用Book学术
本站所有文献仅供个人学习和参考，请勿将文件进行传播。共同遵守网站规定和相关知识产权规定。

上一个求助:其它数据库Naturally Fractured Carbonate Reservoir Characterization: A Case Study of a Mature High-Pour Point Oil Field in Hungary 下一个求助:SpringerBrain-Heart Interactions and Optimizing Psychotherapy