Advance Chemical Mechanical Polishing Technique for Gallium Nitride Substrate

已完结 10 由 c 发布于 2026/7/6 22:36:49

DOI:10.1002/admi.202301032
作者：Xuanyi Zhao, Shouzhi Wang, Lei Liu, Qiubo Li, Jiaoxian Yu, Guodong Wang, Chang Liang, Zhongxin Wang, Han Hao, Xiangang Xu, Lei Zhang
文献类型：期刊论文
补充材料：只需要正文
文献链接：https://doi.org/10.1002/admi.202301032

Wiley

Abstract：As the representative of substrate material, gallium nitride (GaN) has excellent mechanical properties and high thermal stability. Achieving high surface flatness is critical for subsequent

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