Advancing EUV Patterning: Innovations in Resist Platforms, Patterning Strategies, and Computational Approaches

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DOI:10.1021/acs.chemrev.5c01043
作者：Madan Rajendra Biradar,?, ,?Gokhan Sagdic,?, ,?Chenyun Yuan,?, ,?Rika Marui,?, and ,?Christopher Kemper Ober*,?
文献类型：期刊论文
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American Chemical Society (ACS)

Abstract：Advances in microelectronics have been driven by a continuous reduction in feature size, enabled largely by innovations in lithographic technology and patterning materials. In this review, w

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