Abatement of fluorinated compounds using a 2.45?GHz microwave plasma torch with a reverse vortex plasma reactor

已完结 10 由 Tina 发布于 2025/1/27 9:10:20

DOI:10.1016/j.jhazmat.2015.03.016
作者：J.H. Kim , C.H. Cho , D.H. Shin , Y.C. Hong , Y.W. Shin
文献类型：期刊论文
补充材料：只需要正文
文献链接：https://doi.org/10.1016/j.jhazmat.2015.03.016

Elsevier

Abstract：Abatement of fluorinated compounds (FCs) used in semiconductor and display industries has received an attention due to the increasingly stricter regulation on their emission. We have develop

应助信息

求助已完结，文件已删除 如有需求请重新发布求助一键发布

感谢使用Book学术
本站所有文献仅供个人学习和参考，请勿将文件进行传播。共同遵守网站规定和相关知识产权规定。

上一个求助:其它数据库Naturally Fractured Carbonate Reservoir Characterization: A Case Study of a Mature High-Pour Point Oil Field in Hungary 下一个求助:Springer Publishing ConnectDigital Health Literacy Instrument: Brazilian Version-Cross-Cultural Adaptation and Content Validity for Individuals With Heart Failure.