Novel ceria/graphene oxide composite abrasives for chemical mechanical polishing

已完结 10 由 Amber 发布于 2025/2/10 12:40:54

DOI:10.1016/j.ceramint.2024.03.193
作者：Chuandong Chen , Yanying Cui , Xiaopei Li , Sida Shen , Wuping Liao , Hongpeng You
文献类型：期刊论文
补充材料：只需要正文

Elsevier

Abstract：The structure and particle distribution of the abrasive used in chemical mechanical polishing (CMP) directly affect the performance of polishing and quality of the resulting surface. The cer

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