Kinetic acceleration of MoS2 growth by oxy-metal-organic chemical vapor deposition

已完结 10 由 canno 发布于 2026/5/13 11:46:21

DOI:10.1126/science.aec7259
作者：Lei Liu, Yushu Wang, Ruikang Dong, Dongxu Fan, Si Meng, Lang Wu, Shengqiang Wu, Wei Xu, Mingwei Feng, Ningmu Zou, Qingyu Yan, Zehua Hu, Fei
文献类型：期刊论文
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American Association for the Advancement of Science (AAAS)

Abstract：Kinetics determine the growth behavior of thin films, particularly for atomically thin transition-metal dichalcogenides. Metal-organic (MO) chemical vapor deposition (CVD) offers promise for

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