2.45-GHz microwave plasma sources using solid-state microwave generators. ECR-type plasma source

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DOI:10.1080/08327823.2016.1260880
文献类型：期刊论文
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Taylor & Francis

Abstract：ABSTRACT To meet industrial requirements for large-scale processing with high-density and uniform plasma, mandatory for surface treatments to get uniform etching and high deposition rates, w

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