Etching characteristics of crystal quartz by surface wave microwave induced plasma

已完结 10 由 Tina 发布于 2024/11/27 9:38:14

DOI:10.1117/12.2574947
文献类型：期刊论文
补充材料：只需要正文
文献链接：https://doi.org/10.1117/12.2574947

International Society for Optics and Photonics (SPIE)

Abstract：Plasma figuring technologies have been widely used in the processing of silicon-based materials at atmospheric pressure. Previous plasma figuring of silicon based optical surfaces has been u

应助信息

3小时前

biofresh

7ecca527ac6711efad1b34735aa3bc31.pdf 已采纳

3小时前

Book学术机器人

2024/11/27 9:38:14 未找到该文献，机器人已退出，请等待人工下载

2024/11/27 9:38:14 Book学术AI机器人收到请求，开始寻找文献

2024/11/27 9:38:14 已向机器人发送请求

3小时前

Tina 发布求助

上一个求助:其它数据库Naturally Fractured Carbonate Reservoir Characterization: A Case Study of a Mature High-Pour Point Oil Field in Hungary 下一个求助:知网枇杷叶中科罗索酸制备及降血糖活性机理研究