Cross-Scale Topography Achieved by MOPL with Positive Photoresist to Regulate the Cell Behavior

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DOI:10.1002/smll.202303572
作者：Min Guo,&nbsp;Xiang-Yang Liu,&nbsp;Teng Li,&nbsp;Qi Duan,&nbsp;Xian-Zi Dong,&nbsp;Jie Liu,&nbsp;Feng Jin,&nbsp;Mei-Ling Zheng
文献类型：期刊论文
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Wiley

Abstract：Cross-scale micro-nano structures play an important role in semiconductors, MEMS, chemistry, and cell biology. Positive photoresist is widely used in lithography due to the advantages of hig

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