Single-Component High-Resolution Dual-Tone EUV Photoresists Based on Precision Self-Immolative Polymers

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DOI:10.1002/anie.202415588
作者：Jie Cen, Wen Liu, Jie Xu, Xiuxia Wang, Jialin Zhang, Jin Zhang, Zhengyu Deng, Chenggang Zhou, Jinming Hu, Shiyong Liu
文献类型：期刊论文
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Wiley

Abstract：Electron beam (EB) and extreme ultraviolet (EUV) lithography are advanced techniques capable of achieving sub-10 nm resolutions, critical for fabricating next-generation nanostructures and s

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