Low-cost Sn-doped indium oxide films with high mobility by reactive plasma deposition for silicon heterojunction solar cells

已完结 10 由徐徐发布于 2024/11/4 22:25:15

DOI:10.1016/j.solmat.2024.112954
作者：Miaojia Cao , Qi Wang , Jiacheng Shang , Yurong Zhou , Gangqiang Dong , Limeng Zhang , Shuhan Li , Yuhan Cui , Fengzhen Liu , Yuqin Zhou
文献类型：期刊论文
补充材料：只需要正文

Elsevier

Abstract：Sn-doped indium oxide (ITO) film is one of the widely used transparent conductive oxide (TCO) materials. In recent years, reactive plasma deposition (RPD) technology has been used to prepare

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