Trends in photoresist materials for extreme ultraviolet lithography: A review

已完结 10 由 chxyyd 发布于 2024/7/12 17:34:28

DOI:10.1016/j.mattod.2023.05.027
作者：Xiaolin Wang , Peipei Tao , Qianqian Wang, Rongbo Zhao, Tianqi Liu, Yang Hu, Ziyu Hu, Yimeng Wang, Jianlong Wang, Yaping Tang, Hong Xu, Xiangming He
文献类型：期刊论文
补充材料：只需要正文

Elsevier

Abstract：With the development of microelectronics, the demand for continuously miniaturized feature sizes has driven continuous progress in lithography technology. Extreme ultraviolet (EUV) lithograp

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