Recent advances in plasma etching for micro and nano fabrication of silicon-based materials: a review

已完结 10 由 blake 发布于 2026/4/12 13:00:06

DOI:10.1039/D4TC00612G
作者：Chaojiang Li, Yuxin Yang, Rui Qu, Xun Cao, Guodong Liu, Xin Jin, Yuxuan Liu, Shenggui Liu, Wang Jiang and Xianchao Zhang
文献类型：期刊论文
补充材料：只需要正文

Royal Society of Chemistry (RSC)

Abstract：The demands for precision machining of silicon-based materials are growing in various modern applications, including micro-electro-mechanical systems (MEMS), micromotors, sensors, bioelectro

应助信息

11小时前

wanguiying

87ff502b362d11f1a29934735aa3bc31.pdf 已采纳

11小时前

Book学术机器人

2026/4/12 13:00:06 未找到该文献，机器人已退出，请等待人工下载

2026/4/12 13:00:06 Book学术AI机器人收到请求，开始寻找文献

2026/4/12 13:00:06 已向机器人发送请求

11小时前

blake 发布求助

上一个求助:其它数据库Naturally Fractured Carbonate Reservoir Characterization: A Case Study of a Mature High-Pour Point Oil Field in Hungary 下一个求助:ElsevierHow artificial intelligence applications enhance enterprise green total factor productivity? A perspective on human-machine matching and labor skill structure