Optimization of femtosecond laser processing parameters of SiC using ANN-NSGA-II

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DOI:10.1088/1361-651X/ad48a0
文献类型：期刊论文
补充材料：只需要正文
文献链接：https://doi.org/10.1088/1361-651x/ad48a0

IOPscience

Abstract： In the field of femtosecond laser machining, it is essential to select the appropriate process parameters to obtain near thermal damage-free and high eﬃcient machining of SiC wafer. In thi

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