非热等离子体对脉冲激光沉积技术(PLD)制备纯氧化镉薄膜(CdO)结构性能影响的研究

Abdul Ameer Hussein Ali, Hussain Ali Noor, S. Hussain
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引用次数: 0

摘要

本研究采用脉冲激光沉积法(PLD)在玻璃基板上制备了纯(CdO)薄膜,并在室温下分别在不同时间(5、10、15、20)min下进行了沉积。研究了非热等离子体在(30,60)分钟的曝光时间下对所制备薄膜的影响。制备的纯(CdO)膜的x射线衍射(XRD)结果表明,该膜具有立方相的多晶结构,具有择优取向(111)。结果表明,随着(Nd: YAG)激光沉积时间的延长,(111)、(200)、(220)处的衍射峰强度降低。XRD结果还表明,当制备的纯CdO膜暴露于非热等离子体时,其晶体结构不受影响。实验还表明,随着非热等离子体暴露时间的增加,衍射峰的强度减小。AFM测试还表明,表面粗糙度的均方根值(RMS)的变化是不规则的,并且随着沉积时间的增加,表面粗糙度的均方根值(RMS)增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study of the effect of non-thermal plasma on the structural properties of pure Cadmium Oxide thin Films (CdO) prepared by Pulsed laser Deposition Technique ( PLD )
In this research, the preparation of pure ( CdO ) films on a glass substrate was conducted using pulsed laser deposition method (PLD) .The deposition of the films was done at different times ( 5 , 10 , 15 , 20 ) minutes at room temperature . The effect of non-thermal plasma on these prepared films in two exposure times of (30, 60) minutes was studied. The results of X-ray diffraction (XRD) of the prepared pure ( CdO) films showed that the films have polycrystalline structure of cubic phase with preferred orientation (111) . It was noted that the increasing of deposition time of (Nd : YAG) laser , reduces the intensity of diffraction peaks at (111 ) , (200) , (220) . The results of (XRD) have also showed that when the prepared pure ( CdO ) films are exposed to non-thermal plasma , their crystalline structure was not affected . The tests also showed that the increasing of the exposure time to non-thermal plasma causes a decrease in the intensity of the diffraction peaks. The (AFM) tests also demonstrated that the changing in ( RMS ) of the surface roughness is irregular and it was found that the ( RMS ) increases by increasing the deposition time.
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