气相中硅离子的骨架重排:一些苯恶西林的质谱

I. Lengyel, M. Aaronson
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引用次数: 3

摘要

10,10-二甲基-(Ia)和10,10-二苯基-苯氧西林(Ib)的分子离子在10位上连续消去两个取代基,然后从中心环上喷射出SiO。(Ia)片段中的(M - R)+物质通过CH2O、SiH2O和SiHO·的竞争性排出,涉及复杂的分子重组。在C(烷基)-C(芳基)键形成过程中产生了丰富的m/e 91 (C7H7)峰。氧桥与两个芳香氢原子(H2O)在(Ib)中的(M - R)+峰上的独特挤压导致在M /e 255处有丰富的偶电子硅离子。在化合物(Ib)中也观察到SiHO·从(M - R)+物质中被排出。在化合物(Ia)和(Ib)中,二苯并呋喃的元素从分子离子中丢失,形成二价硅离子SiR2˙+。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Skeletal rearrangements of siliconium ions in the gas phase: mass spectra of some phenoxasilins
The molecular ions of both 10,10-dimethyl-(Ia) and 10,10-diphenyl-phenoxasilin (Ib) undergo consecutive elimination of the two substituents from position 10, followed by ejection of SiO from the centre ring. The (M– R)+ species in (Ia) fragments by competitive expulsion of CH2O, SiH2O, and SiHO·, which involves complex molecular reorganizations. An abundant m/e 91 (C7H7) peak, generated through C(alkyl)–C(aryl) bond formation, is noted. The unique extrusion of the oxygen bridge in conjunction with two aromatic hydrogen atoms (H2O) from the (M– R)+ peak in (Ib) leads to an abundant even-electron siliconium ion at m/e 255. The expulsion of SiHO· from the (M– R)+ species is also observed in compound (Ib). The elements of dibenzofuran are lost from the molecular ion to give divalent siliconium ions SiR2˙+ in both compounds (Ia) and (Ib).
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