类金刚石碳涂层在介电辅助加速结构中的多因素抑制

S. Mori, M. Yoshida, D. Satoh
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引用次数: 7

摘要

多因素放电在加速器领域广泛存在,为了提高加速器的性能,对多因素放电进行了抑制研究。介电辅助加速(DAA)腔是利用介电层的反射在室温下达到100,000以上q值的驻波加速腔;预计DAA腔将用于小型射频电源和高负载工作。到目前为止,DAA腔的最大加速场被多因子限制在几MV/m。通过采用类金刚石(DLC)涂层来降低二次电子发射系数,而不牺牲腔体的q值,我们证明了可以将$6~[{\rm \ μ s}]$ RF脉冲注入到电场大于10~[MV/m]的DAA腔体中,同时抑制多因子。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Multipactor suppression in dielectric-assist accelerating structures via diamondlike carbon coatings
Multipactor discharges are widely observed in the accelerator field, and their suppression has been studied to improve accelerator performance. A dielectric-assist accelerating (DAA) cavity is a standing-wave accelerating cavity that attains a Q-value of over 100,000 at room temperature by using the reflection of the dielectric layer; the DAA cavity is expected to be used with a small RF power source and high-duty operation. Thus far, the maximum accelerating field of DAA cavities has been limited to a few MV/m by the multipactor. By applying a diamond-like carbon (DLC) coating to reduce the secondary electron emission coefficient without sacrificing the Q-value of the cavity, we have demonstrated that a $6~[{\rm \mu s}]$ RF pulse can be injected into a DAA cavity with a field of more than 10~[MV/m] while suppressing the multipactor.
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